io-1000 pad is a non-woven textile (rayon and acetate fibers in a binder) with a nominal finished thickness of 0.028 inches with a tolerance of ± 0.002 inches.  The face of the pad has been buffed to enhance flatness on polishing substrates.  A wetted pad can expand up to 25% in thickness while maintaining its surface uniformity and parallelism. 

It is recommended for use in polishing hard materials such as ceramics, optical glass, and crystals.  This pad was designed to provide rapid stock removal while achieving superb surface finishes.  Recommended for use on most abrasive types, such as diamond, aluminum oxide, colloidal silica, and ceria.
 

io-1000S - Uncut sheet approx. 44” x 70”
io-1000D - Cut Discs
Example: io-1000D16 = 16” dia. disc.
 

io-1000 series come with a pressure-sensitive adhesive coating that provides firm adhesion to metal and ceramic plates while making it easy to peal off the lap.  It has a 0.003” polyester barrier between the pad material and the pressure-sensitive adhesive coating.  This barrier is impervious to oil, alcohol, glycol and water.  A removable paper protects the adhesive backing.
 

Highly recommended for polishing soft materials used in ophthalmic glass polishing, fiber optics, optical lenses,  and crystals.

• For example: Quartz, CaF₂, ZnSe, Brass, LiNbO₃.

• Provides fast MRR on hard substrates that requires diamond or alumina slurry for polishing.

• Can produce surface roughness as low as 5Å

• Provides excellent flatness, comparable to pitch polishing.

• Highly durable and long lasting performance.

• Excellent polishing repeatability.

io-2000 series are fiber based and resin treated (polyurethane)  pads with a nominal finished thickness ranging from 0.05 inches to 1 inch.  io-2000 series are designed to accommodate diverse polishing applications and surfaces.  The fiber material makes excellent interconnecting cellular structures, which makes the pad highly durable and dimensionally stable. A wetted pad can expand up to 10% in thickness while maintaining its surface uniformity and parallelism. 

io-2000 series are designed to have controlled density and hardness ranging from B Scale 60 up to C Scale 60+.   

These pads are designed to provide rapid stock removal while achieving superb surface finishes.  Recommended for use on most abrasive types, such as diamond, aluminum oxide, colloidal silica, and ceria.
 

io-2000 series come with a pressure-sensitive adhesive coating that provides firm adhesion to metal and ceramic plates while making it easy to peal off the lap.  It has a 0.003” polyester barrier between the pad material and the pressure-sensitive adhesive coating.  This barrier is impervious to oil, alcohol, glycol and water.  A removable paper protects the adhesive backing.

These pads are also available in magnetic backing.
 

Recommended for polishing both hard and soft materials:  Silicon wafers, cadmium telluride, gallium arsenide, ceramics, glass, quartz, sapphire and metals.
 

• Provides fast MRR on hard substrates that requires abrasive slurry for polishing.

• Provides excellent flatness, comparable to pitch polishing.

• Highly durable and long lasting performance.

• Excellent polishing repeatability.